Event
- Event ID
- 41
- Quality
- Description
The incident occurred when cleaning the exhaust gas-processing equipment at a semiconductor factory.
The inside of the water scrubber was washed with hydrofluoric acid. This is a normal operation aiming at cleaning the internal surfaces from the material deposited during operation. This material consists usually in silicon oxide. However, in the case of the incident, it consisted of an external layer of oxide, covering metallic silicon. After the surface silicone oxide dissolves, the silicon and hydrogen fluoride react, generating hydrogen. The above became clear after the accident. Therefore, a backflow of air during the drainage of the cleaning fluid formed a combustible a hydrogen-air mixture, which ignited and exploded.
The water scrubber was damaged by the explosion. Two persons were exposed to the solution which was scattered and were slightly injured.- Event Initiating system
- Classification of the physical effects
- Hydrogen Release and Ignition
- Nature of the consequences
- Macro-region
- Asia
- Country
- Japan
- Date
- Component involved
- treatment system (gas / fume / dust)
- Failure mode
- internal explosion
- Initiating cause
- accidental hydrogen formation
- Root CAUSE analysis
The INITIATING/direct cause was the accidental formation of hydrogen from an unexpected reaction.
The ignition source was probably an exothermal and explosive decomposition of compounds.
Contributing causes were:
(i) The operation management did not understand the process ongoing in the scrubber, and did not consider the possibility of unwanted reaction
(ii) Poor discipline and enforcement of procedure. The investigation revealed that the operators were supposed to put on protective gear before work, but they did not do so because they did not handle hydrofluoric acid directly. Although a operational standard was prepared, a manager who was not a chemical specialist changed the procedure.- Root causes
- Date entry in HIAD
- 01/12/2023
Facility
- Application
- Electrical, electronics and micro-electronics industry
- Sub-application
- semiconductors production
- Hydrogen supply chain stage
- All components affected
scrubber
- Location type
- Confined
- Location
- industrial area
- Operational condition
- Pre-event occurrences
The usual procedure for the cleaning of the scrubber was to wash it with hydrofluoric acid. This is a normal operation aiming at cleaning the internal surfaces from the material deposited during operation, which normally consists in silicon oxide.
Emergency & Consequences
- Number of fatalities
- 0
- Number of injured persons
- 1
- Post-event summary
Two persons were exposed to the acid solution which was scattered around the place by the explosion and were slightly injured.
The water scrubber was damaged by the explosion.- Emergency action
The only emergency action was the rescue of the injured worker.
Lesson Learnt
- Corrective Measures
Changing the structure to prevent a reverse flow of air.
Installing a flow meter and conducting enough purging with nitrogen.
Not allowing operators to change operation standards by their own judgment.
Always wearing the prescribed protective gear.
In-depth data
- Release type
- gas
- Involved substances (% vol)
- H2 100%
- Probable IGNITION SOURCE
- Explosion type
References
- Sources categories
- JST
- Reference & weblink
JST failures database:
https://www.shippai.org/fkd/en/cfen/CC1200095.html
(accessed Dec 2023)